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Depositordc.contributorWalton, Anthony
Funderdc.contributor.otherEPSRC - Engineering and Physical Sciences Research Councilen_UK
Data Creatordc.creatorMurray, Jeremy
Date Accessioneddc.date.accessioned2017-07-03T15:58:07Z
Date Availabledc.date.available2017-10-01T04:15:09Z
Citationdc.identifier.citationMurray, Jeremy. (2017). The use of test structures to perform chip level characterisation studies of Ni and NiFe electrochemical deposition, [dataset]. University of Edinburgh. School of Engineering. https://doi.org/10.7488/ds/2091.en
Persistent Identifierdc.identifier.urihttps://hdl.handle.net/10283/2760
Persistent Identifierdc.identifier.urihttps://doi.org/10.7488/ds/2091
Dataset Description (abstract)dc.description.abstractThis paper describes the first use of test structures designed to characterise the fundamental properties of nickel and nickel-iron alloy films deposited using electroplating. The structures are used to perform a chip-level investigation into the effects of electrolyte bath composition on the characteristics of deposited films. The advantage of this methodology is that each electrolyte change does not require the replacement of the large volume bath associated with wafer scale manufacturing investigations, thereby making the characterisation and optimisation of electroplating baths far less time consuming, and considerably more cost effective.en_UK
Dataset Description (TOC)dc.description.tableofcontentsREADME.xdoc - Description of data related to figures Data-TSM17_Paper.xls - Data used to create figuresen_UK
Languagedc.language.isoengen_UK
Publisherdc.publisherUniversity of Edinburgh. School of Engineeringen_UK
Rightsdc.rightsCreative Commons Attribution 4.0 International Public Licenseen
Subjectdc.subjectElectrodepositionen_UK
Subjectdc.subjectMEMSen_UK
Subjectdc.subjectNickelen_UK
Subjectdc.subjectNiFeen_UK
Subjectdc.subjectPermalloyen_UK
Subjectdc.subjectoptimisationen_UK
Subjectdc.subjectstressen_UK
Subjectdc.subjectstrainen_UK
Subjectdc.subjecttest structuresen_UK
Subjectdc.subjectMicrofabicationen_UK
Subject Classificationdc.subject.classificationEngineeringen_UK
Titledc.titleThe use of test structures to perform chip level characterisation studies of Ni and NiFe electrochemical depositionen_UK
Typedc.typedataseten_UK

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